Graphene Production
Advanced manufacturing processes delivering consistent, high-purity graphene at industrial scale.
Proprietary CVD Process
Astera Technologies utilizes advanced Chemical Vapor Deposition (CVD) to produce single-layer and few-layer graphene with exceptional structural integrity and electronic properties.
Our proprietary reactor design enables precise control over growth parameters, resulting in graphene with:
- 99.9% carbon purity
- Large-area monolayer coverage (>95%)
- Electron mobility exceeding 15,000 cm²/V·s
- Sheet resistance below 350 Ω/sq
- Defect density < 10¹⁰ cm⁻²
01
Substrate Prep
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02
CVD Growth
↓
03
Transfer
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04
Quality Control
Material Specifications
| Parameter | Standard Grade | Premium Grade | Research Grade |
|---|---|---|---|
| Layer Count | 1-3 layers | 1-2 layers | Single layer (>98%) |
| Lateral Size | 5-20 μm | 10-50 μm | 50-100 μm |
| Purity | >99.0% | >99.5% | >99.9% |
| Defect Density | < 10¹¹ cm⁻² | < 5×10¹⁰ cm⁻² | < 10¹⁰ cm⁻² |
| Sheet Resistance | < 800 Ω/sq | < 500 Ω/sq | < 350 Ω/sq |
Raman Spectroscopy
Layer count and defect characterization
Scanning Electron Microscopy
Surface morphology and coverage analysis
Electrical Testing
Sheet resistance and mobility measurement
Quality Assurance
Every batch of Astera graphene undergoes comprehensive characterization to ensure it meets our stringent specifications before shipment.
Our quality control laboratory is equipped with industry-leading analytical instruments:
- Raman spectroscopy (mapping capable)
- Atomic force microscopy (AFM)
- Scanning electron microscopy (SEM)
- X-ray photoelectron spectroscopy (XPS)
- Electrical characterization stations